low-dielectric

基本解释

• 低介电常数

同根派生

英汉例句

• Various CVD technologies for preparing low dielectric constantmaterials in ULSI circuits are summarized.
  综述了制备ULSI低介电常数材料的各种CVD技术。
• Fluorin doped DLC films have low dielectric constant, and furthermore they are hydrophobe and anti-corrupttion.
  掺氟DLC膜在憎水性、耐蚀性、热稳定性和降低介电常数等方面更为优异；
• Dual damascene technology of Cu / low dielectric layer is introduced in this paper, andthis technology has been used in manufacturing DRAM and logic devices.
  介绍了铜/低介电常数介电层的双嵌入式工艺,该工艺已大规模应用于动态记忆存储器(DRAM)和逻辑电路器件中。
• In order to alleviate the problems, low dielectric constant (k) materials are used to replace the conventional intermetal dielectric (IMD), SiO2.
  为了改善这些问题，使用低介电常数材料作为导线间的介电层为必要选择。
• Dual damascene technology of Cu/ low dielectric layer is introduced in this paper, andthis technology has been used in manufacturing DRAM and logic devices.
  介绍了铜/介电常数介电层的双嵌入式工艺,该工艺已大规模应用于动态记忆存储器(RAM)逻辑电路器件中。